Novel development of an inductively coupled thermal plasma with pulse amplitude modulation of electromagnetic field

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 138, Issue 4, 2002, Pages 26-33

  Tsuchida, Hidekazu ^a   Kamata, Isaho ^a   Jikimoto, Tamotsu ^a   Izumi, Kunikazu ^a  

^a CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

Author keywords

Ar spectrum; Inductively coupled thermal plasma; Pulse modulation; Temperature variation

Indexed keywords

ARGON; ELECTRIC COILS; ELECTRIC CURRENTS; ELECTRIC INVERTERS; ELECTRIC WAVEFORMS; ELECTROMAGNETIC FIELDS; MOSFET DEVICES; PLASMA INTERACTIONS; PULSE AMPLITUDE MODULATION; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS;

BOLTZMANN PLOT METHOD; INDUCTIVELY COUPLED THERMAL PLASMA; INVERTER POWER SUPPLY; PLASMA DYNAMICS; VACUUM CHAMBER;

INDUCTIVELY COUPLED PLASMA;

EID: 0036499375     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/eej.1135     Document Type: Article

References (8)

1. Control of SiC thermal plasma synthesis
2. Surface modification of Bi-Sr-Ca-Cu-O films deposited in situ by radio frequency plasma flash evaporation with a scanning tunneling microscope
3. R.F.-plasma system for the production of ultrafine, ultrapure silicon carbide powder
4. Manufacture of fine-grain materials using thermal plasma process
5. Transient response of the radio frequency inductively coupled plasma to a sudden change in power
6. Generation of large area inductively coupled plasma at atmospheric pressure with high efficiency
7. Plasma spectrometry