Boron ion implantation into silicon by use of the boron vacuum-arc plasma generator

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 261-265

  Williams, J M ^a   Klepper, C C ^a,b   Chivers, D J ^c   Hazelton, R C ^b   Moschella, J J ^b   Keitz, M D ^b  

^a Brontek Delta Corporation   (United States)

^b HY Tech Research Corporation   (United States)

^c Ion Links Int Ltd   (United Kingdom)

Author keywords

Boron; Cathodic arc; Ion implantation; Macroparticles; Shallow junction doping; Vacuum arc

Indexed keywords

EID: 33846989809     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401509     Document Type: Conference Paper

References (10)

1. Patent pending
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