Plasma immersion ion implantation applied to P+N junction solar cells

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 253-256

  Vervisch, Vanessa ^a,b   Barakel, D ^a   Torregrosa, F ^b   Ottaviani, L ^a   Pasquinelli, M ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

^b Ion Beam Services   (France)

Author keywords

N type Silicon; Plasma immersion ion implantation; Shallow junction; Solar cells

Indexed keywords

EID: 33846945433     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401507     Document Type: Conference Paper

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