Optimization of process parameters to archieve high quality as-deposited indium-tin oxide films for display applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1173-1179

  Gupta, Subhadra ^a   Ada, Earl ^b  

^a University of Alabama   (United States)

^b UNIVERSITY OF ALABAMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; DEPOSITION TEMPERATURES; PROCESS PARAMETERS;

ANNEALING; CATHODES; ELECTRIC CONDUCTIVITY; INDIUM COMPOUNDS; OPTIMIZATION; STRENGTH OF MATERIALS; TIN COMPOUNDS;

THIN FILMS;

EID: 31044439784     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1875152     Document Type: Conference Paper

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