Preferentially oriented thin-film growth of CuO(1 1 1) and Cu2O(0 0 1) on MgO(0 0 1) substrate by reactive dc-magnetron sputtering

Vacuum

Volumn 81, Issue 7, 2007, Pages 904-910

  Itoh, Takahiro ^a   Maki, Kunisuke ^a  

^a YOKOHAMA CITY UNIVERSITY   (Japan)

Author keywords

Cu2O; CuO; dc magnetron sputtering; Reactive sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER OXIDES; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRUCTURAL ANALYSIS; X RAY DIFFRACTION;

DC-MAGNETRON SPUTTERING; REACTIVE SPUTTERING; SOLID-PHASE HETEROEPITAXIAL GROWTH;

THIN FILMS;

EID: 33846853944     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.10.012     Document Type: Article

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