Advanced E-Beam lithography system JBX-9000MV for 180nm masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 21-27

  Takemura, Hitoshi ^a   Komagata, Tadashi ^a   Nakagawa, Yasutoshi ^a   Tanaka, Kazumitsu ^a  

^a JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRIC SPACE CHARGE; ELECTRON BEAM LITHOGRAPHY; ELECTRON OPTICS; INTEGRATED CIRCUIT MANUFACTURE;

SPACE CHARGE EFFECT; VARIABLE SHAPED BEAM;

MASKS;

EID: 0033332214     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373325     Document Type: Conference Paper

References (3)