Mask data volume - Historical perspective and future requirements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6281, Issue , 2006, Pages

  Spence, Chris ^a,c   Goad, Scott ^a,c   Buck, Peter ^b,c   Gladhill, Richard ^b   Cinque, Russell ^b,f   Preuninger, Jürgen ^c,d   Griesinger, Üwe ^c,d   Blöcker, Martin ^c,e  

^a AMD   (United States)

^b Toppan Photomasks Inc   (United States)

^c IFX ^*  (United States)

^d INFINEON TECHNOLOGIES AG   (Germany)

^e Advanced Mask Technology Center GmbH and Co KG   (Germany)

^f Toppan Photomasks Germany GmbH HR   (Germany)

Author keywords

MaSk Data Prep (MDP); Optical Proximity Correction (OPC); Variable Shaped Beam (VSB)

Indexed keywords

DATA REDUCTION; DYNAMIC RANDOM ACCESS STORAGE; FLASH MEMORY; IMAGE ENHANCEMENT; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;

INTEGRATED DEVICE MANUFACTURER (IDM); MASK DATA PREP (MDP); OPTICAL PROXIMITY CORRECTION (OPC); VARIABLE SHAPED BEAM (VSB);

MASKS;

EID: 33748081129     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692639     Document Type: Conference Paper

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