Development of a E-Beam Lithography System for 100-90nm Node Reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 328-338

  Komagata, Tadashi ^a   Kawase, Yuichi ^a   Nakagawa, Yasutoshi ^a   Gotoh, Nobuo ^a   Tanaka, Kazumitsu ^a  

^a JEOL LTD   (Japan)

Author keywords

Beam deflection; Electron beam lithography; Mask; Reticle; Shaped beam

Indexed keywords

CURRENT DENSITY; DATA TRANSFER; ELECTROOPTICAL DEVICES; ELECTROSTATIC DEVICES; MASKS; PRODUCT DESIGN;

ELECTRON BEAM DEFLECTION; RETICLES; SHAPED BEAM;

ELECTRON BEAM LITHOGRAPHY;

EID: 1642514767     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504261     Document Type: Conference Paper

References (2)

1. T.Komagata, Y.Nakagawa, H.Takemura, N.Gotoh, K.Tanaka "Development of a Next Generation E-Beam, Lithography System for 1Gbit Dram Masks", SPIE vol.3331/313,(1998)
2. T.Komagata, Y.Nakagawa, N.Gotoh, K.Tanaka "Performance of improved e-beam lithography system JBX-9000MVII", SPIE vol.4409/248, (2001)