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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 1 B, 2005, Pages 684-687

Improvement in crystallinity of ZnO films prepared by rf magnetron sputtering with grid electrode

(5) Yasui, Kanji a Phuong, Nguyen Viet a Kuroki, Yuichirou a Takata, Masasuke a Akahane, Tadashi a

a NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Crystallinity; Grid electrode; Magnetron sputtering; Negative bias; Zinc oxide

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRODES; ELECTRONS; MAGNETRON SPUTTERING; THERMAL EFFECTS; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINITY; ELECTRON TEMPERATURE; GRID ELECTRODES; NEGATIVE BIAS;

THIN FILMS;

EID: 17044384579 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.44.684 Document Type: Conference Paper

Times cited : (16)

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