Relative humidity effects in dip-pen nanolithography of alkanethiol mixtures

Langmuir

Volumn 22, Issue 26, 2006, Pages 10912-10914

  Nafday, Omkar A ^a   Weeks, Brandon L ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKANETHIOL MIXTURES; DIP-PEN NANOLITHOGRAPHY; MERCAPTOHEXADECANOIC ACID (MHA);

ATMOSPHERIC HUMIDITY; HYDROGEN SULFIDE; PARAFFINS;

LITHOGRAPHY;

EID: 33846375465     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la062110a     Document Type: Article

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