Aqueous KOH etching of silicon (110): Etch characteristics and compensation methods for convex corners

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2499-2508

  Kim, Byungwook ^a,b   Cho, Dong Il Dan ^a  

^a Seoul National University   (South Korea)

^b ELECTROCHEMICAL SOCIETY   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ETCHING; POTASSIUM COMPOUNDS; SOLUTIONS;

ANISOTROPIC ETCHING; POTASSIUM HYDROXIDE;

SEMICONDUCTING SILICON;

EID: 0032121946     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838668     Document Type: Article

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