Al-doped ZnO thin films deposited by reactive frequency magnetron sputtering: H2-induced property changes

Thin Solid Films

Volumn 515, Issue 5, 2007, Pages 3057-3060

  Liu, Weifeng ^a   Du, Guotong ^a,b   Sun, Yanfeng ^b   Xu, Yibin ^a   Yang, Tianpeng ^b   Wang, Xinsheng ^a   Chang, Yuchun ^b   Qiu, Fabin ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

Al doped zinc oxide; Hydrogen; Sputtering; Transparent conductive oxides; Zin oxide

Indexed keywords

ALUMINUM COMPOUNDS; DOPING (ADDITIVES); HYDROGEN; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; ZINC OXIDE;

AL DOPED ZINC OXIDE; AZO FILMS; LOW RESISTIVITY; TRANSPARENT CONDUCTIVE OXIDES;

THIN FILMS;

EID: 33845992584     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.021     Document Type: Article

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