Topographical evolution of sputtered chromium nitride thin films

Thin Solid Films

Volumn 515, Issue 5, 2007, Pages 2903-2920

  Gerbig, Y B ^a   Spassov, V ^a   Savan, A ^b   Chetwynd, D G ^c  

^a CSEM   (Switzerland)

^b CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR   (Germany)

^c UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

Chromium nitride; Film morphology; Growth mechanism; Surface topography

Indexed keywords

CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; SURFACE TOPOGRAPHY; VOLTAGE CONTROL;

BIAS VOLTAGE; CHROMIUM NITRIDE; DEPOSITION PARAMETERS; FILM MORPHOLOGY; GROWTH MECHANISMS;

THIN FILMS;

EID: 33845938034     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.031     Document Type: Article

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