Optical superlattices - A strategy for designing phase-shift masks for photolithography at 248 and 193 nm: Application to AIN/CrN

Applied Physics Letters

Volumn 70, Issue 18, 1997, Pages 2371-2373

  Carcia, P F ^a   French, R H ^a   Reilly, M H ^a   Lemon, M F ^a   Jones, D J ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHROMIUM COMPOUNDS; DIELECTRIC MATERIALS; LIGHT TRANSMISSION; MASKS; METALLIC FILMS; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; PHASE SHIFT; PHOTOLITHOGRAPHY; SUPERLATTICES;

ALUMINUM NITRIDE; CHROMIUM NITRIDE; OPTICAL CONSTANTS; OPTICAL SUPERLATTICES;

OPTICAL MULTILAYERS;

EID: 0031554187     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118876     Document Type: Article

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