Studies of the evolution of the topography of selected materials as a function of etching in reactive and non-reactive r.f. plasmas

Surface and Coatings Technology

Volumn 106, Issue 1, 1998, Pages 82-89

  Anderson, C A ^a   Brown, N M D ^a   Cui, Naiyi ^a   Liu, Zhihui ^a   McKinley, A ^a   Walker, C G H ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; GRAPHITE; MICA; MOLYBDENUM COMPOUNDS; OXYGEN; PRESSURE EFFECTS; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS;

TOPOGRAPHY;

PLASMA ETCHING;

EID: 0032117271     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)90142-0     Document Type: Article

References (4)

1. Hong-Xing You N.M.D. Brown K.F. Al-Assadi Surf. Sci. 284 1993 263
2. Hong-Xing You N.M.D. Brown K.F. Al-Assadi Surf. Sci. 279 1992 189
3. N.M.D. Brown Zhi-Hui Liu Appl. Surf. Sci. 90 1995 155
4. N.M.D. Brown, A. McKinley, Naiyi Cui, unpublished work.