Structural and optical properties of ZnO films with different thicknesses grown on sapphire by MOCVD

Chemical Research in Chinese Universities

Volumn 22, Issue 5, 2006, Pages 552-555

  Hou, Chang Min ^a   Huang, Ke Ke ^a   Gao, Zhong Min ^a   Li, Xiang Shan ^a   Feng, Shou Hua ^a   Zhang, Yuan Tao ^a   Du, Guo Tong ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

MOCVD; PL spectrum; Thickness; ZnO film

Indexed keywords

EID: 33845909568     PISSN: 10059040     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1005-9040(06)60160-8     Document Type: Article

References (14)

1. Service R.F. Science 276 1997 895
2. D.M. Bagnall Y.F. Chen Z. Zhu Appl. Phys. Lett. 70 1997 2230
3. Z.K. Tang G.K.L. Wang Yu P. Appl. Phys. Lett. 72 1998 3270
4. T.T. Wu Wang W.S. J. Appl. Phys. 96 2004 5249
5. S.S. Kim Lee B.T. Thin. Solid. Films 446 2004 307
6. H. Kato K. Miyamoto M. Sato Appl. Phys. Lett. 84 2004 4562
7. K.K. Kim J.H. Song H.J. Jung J. Appl. Phys. 87 2000 3573
8. Y. Ma G.T. Du T.P. Yang J. Cryst. Growth 255 2003 303
9. Y. Chen D.M. Bagnall H.J. Koh J. Appl. Phys. 84 1998 3912
10. S.I. Park T.S. Cho S.J. Doh Appl. Phys. Lett. 77 2000 349
11. R.D. Vispute V. Talyansky Trajanovic Z. Appl. Phys. Lett. 70 1997 2735
12. S.F. Chichibu T. Yoshida T. Onuma J. Appl. Phys. 91 2002 874
13. Bylander E.G. J. Appl. Phys. 49 1978 1188
14. K. Vanheusden C.H. Seager W.L. Warren Appl. Phys. Lett. 68 1996 403