Microstructural evolution of ZnO by wet-etching using acidic solutions

Journal of Nanoscience and Nanotechnology

Volumn 6, Issue 11, 2006, Pages 3364-3368

  Lee, Ji Myon ^a   Kim, Kyoung Kook ^b   Hyun, Chan Kyung ^b   Tampo, Hitoshi ^b   Niki, Shigeru ^b  

^a Sunchon National University   (South Korea)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Etch; Hexagonal pyramid; Microstructure; Surface roughness; ZnO

Indexed keywords

ACID CONCENTRATION; ACIDIC SOLUTIONS; ETCHANTS; HEXAGONAL PYRAMIDS;

CONCENTRATION (PROCESS); ETCHING; HYDROCHLORIC ACID; MICROSTRUCTURE; SOLUTIONS; SURFACE ROUGHNESS; ZINC OXIDE;

THIN FILMS;

ACID; HYDROCHLORIC ACID; NANOPARTICLE; PHOSPHORIC ACID; WATER; ZINC OXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

ACIDS; HYDROCHLORIC ACID; MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; NANOTECHNOLOGY; PHOSPHORIC ACIDS; TEMPERATURE; WATER; ZINC OXIDE;

EID: 33845736105     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2006.011     Document Type: Conference Paper

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