Micro-patterning of ZnO single crystal surface by anisotropic wet-chemical etching

Thin Solid Films

Volumn 486, Issue 1-2, 2005, Pages 42-45

  Takahashi, Kenji ^a,b   Funakubo, Hiroshi ^a   Ohashi, Naoki ^b   Haneda, Hajime ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Anisotropic etching; Micro fabrication; Wet chemical etching; Zinc oxide (ZnO)

Indexed keywords

ACETIC ACID; ANISOTROPY; CRYSTALLOGRAPHY; ELECTRON BEAM LITHOGRAPHY; ETCHING; HYDROCHLORIC ACID; MICROSTRUCTURE; REACTION KINETICS; SINGLE CRYSTALS; SOLUTIONS; SURFACE CHEMISTRY; WETTING;

ANISOTROPIC ETCHING; MICRO-FABRICATION; WET-CHEMICAL ETCHING; ZNO;

ZINC OXIDE;

EID: 21844460008     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.221     Document Type: Conference Paper

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