When structural noise is the signal: Speckle statistics in fluctuation electron microscopy

Ultramicroscopy

Volumn 107, Issue 2-3, 2007, Pages 166-171

  Treacy, M M J ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Amorphous Ge; Amorphous Si; Dark field speckle; Fluctuation electron microscopy; Medium range order; Speckle

Indexed keywords

AMORPHOUS SILICON; DIFFRACTION; ELECTRON MICROSCOPY; MATHEMATICAL MODELS; SPECKLE; STATISTICAL METHODS;

FLUCTUATION ELECTRON MICROSCOPY; IMAGE RESOLUTION;

SPURIOUS SIGNAL NOISE;

ANALYTIC METHOD; ARTICLE; DIFFRACTION; ELECTRON MICROSCOPY; FILTER; IMAGE PROCESSING; MATERIALS; SIGNAL NOISE RATIO; STANDARD;

EID: 33845679016     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2006.07.001     Document Type: Article

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18. {ring operator} C. The data presented here are from the extensive regions of disordered film that separated these isolated crystallites.
19. Ideally, such low-pass filters should be applied to the exit wavefunction at the sample rather than to the image wavefunction, which has already been filtered by the objective lens and aperture.