Spontaneous growth of indium nanostructures

Journal of Crystal Growth

Volumn 297, Issue 2, 2006, Pages 300-305

  Wei, Helin ^a   Zhang, Lei ^a   Liu, Zuli ^a   Huang, Hanchen ^b   Zhang, Xixiang ^c  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

A1. Growth models; A1. Low dimensional alloy surface; A1. Nanostructures; A1. Non wetting; A3. DC magnetron sputtering; B1. Indium hillock

Indexed keywords

ATOMIC FORCE MICROSCOPY; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM; SEMICONDUCTOR GROWTH; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

GROWTH MODELS; INDIUM HILLOCK; LOW-DIMENSIONAL ALLOY SURFACES; NON-WETTING CONDITIONS;

NANOSTRUCTURED MATERIALS;

EID: 33845594199     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.09.048     Document Type: Article

References (19)

1. Orlov A.O., Amlani I., Bernstein G.H., Lent C.S., and Snider G.L. Science 277 (1997) 928
2. Andres R.P., Bein T., Dorogi M., Feng S., Henderson J.I., Kubiak C.P., Mahoney W., Osifchin R.G., and Reifenberger R. Science 272 (1996) 1323
3. Shchukin V.A., and Bimberg D. Rev. Mod. Phys. 71 (1999) 1125
4. Sun S., Murray C.B., Weller D., Folks L., and Moser A. Science 287 (2000) 1989
5. Bromann K., Félix C., Brune H., Harbich W., Monot R., Buttet J., and Kern K. Science 274 (1996) 956
6. Ross F.M., Tersoff J., and Tromp R.M. Phys. Rev. Lett. 80 (1998) 984
7. Sanguinetti S., Mano T., Oshima M., Tateno T., Wakaki M., and Koguchi N. Appl. Phys. Lett. 81 (2002) 3067
8. Brunner K. Rep. Prog. Phys. 65 (2002) 27
9. Wei H.L., Huang H., Woo C.H., Zheng R.K., Wen G.H., and Zhang X.X. Appl. Phys. Lett. 80 (2002) 2290
10. Huang H., Wei H.L., Woo C.H., and Zhang X.X. Appl. Phys. Lett. 82 (2003) 4265
11. Sanchez Jr. J.E., and Arzt E. Scr. Metall. Mater. 27 (1992) 285
12. Gladkikh A., Lereah Y., Glickman E., Karpovski M., Palevski A., and Schubert J. Appl. Phys. Lett. 66 (1995) 1214
13. Sutter P., Mateeva E., and Lagally M.G. J. Vac. Sci. Technol. B 16 (1998) 1560
14. Hu M., Noda S., Okubo T., Yamaguchi Y., and Komiyama H. J. Appl. Phys. 94 (2003) 3492
15. Wei H.L., Huang H., Woo C.H., Zhang X.X., and Zhou L.G. Appl. Phys. Lett. 84 (2004) 5401
16. Bailey P., Noakes T.C.Q., and Woodruff D.P. Surf. Sci. 426 (1999) 358
17. Wider H., Gimple V., Evensonl W., Schatz G., Jaworski J., Prokop J., and Marszaek M. J. Phys: Condens. Matter 15 (2003) 1909
18. Albrecht M., Maier A., Treubel F., Maret M., Poinsot R., and Schatz G. Europhys. Lett. 56 (2001) 884
19. Schmid A.K., Bartelt N.C., and Hwang R.Q. Science 290 (2000) 1561