Effective exposure-dose monitor technique for critical dimension control in optical lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 2, 2003, Pages 129-135

  Asano, Masafumi ^a   Izuha, Kyoko ^a   Fujisawa, Tadahito ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Critical dimension; Dose monitor; Effective dose; Effective focus; Optical lithography

Indexed keywords

EID: 24644511944     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1564594     Document Type: Article

References (4)

1. C. P. Ausschnitt, C. J. Progier, and W. Chu, "CD control of low k-factor step-and-scan lithography," Proc. SPIE 4346, 293-302 (2001).
2. S. Inoue, T. Fujisawa, and K. Izuha, "Effective exposure dose measurement in optical microlithography," Proc. SPIE 3998, 810-818 (2000).
3. K. Izuha, T. Fujisawa, M. Asano, and S. Inoue, "Highly accurate and precise measurement technique for effective exposure dose," Jpn. J. Appl. Phys., Part 1 39, 6796-6800 (2000).
4. A. Starikov, "Exposure monitor structure," Proc. SPIE 1261, 315-324 (1990).