Feed-forward control for a lithography/etch sequence

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4182, Issue 1, 2000, Pages 31-39

  Öchsner, Richard ^a   Tschaftary, Thomas ^a   Sommer, Stefan ^b   Pfitzner, Lothar ^a   Ryssel, Heiner ^a,b   Gerath, Harald ^c   Baier, Christine ^c   Hafner, Martin ^c  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

Advanced process control; Feed forward; Lithography etch sequence; Run to run control

Indexed keywords

ANTIREFLECTION COATINGS; ETCHING; FEEDBACK CONTROL; LITHOGRAPHY; PHOTORESISTS;

ADVANCED PROCESS CONTROL; CRITICAL DIMENSION (CD); FEEDFORWARD CONTROL; RUN TO RUN CONTROL;

PROCESS CONTROL;

EID: 0034545654     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410080     Document Type: Article

References (0)