Laser-induced chemical liquid deposition of discontinuous and continuous copper films

Surface and Coatings Technology

Volumn 201, Issue 8, 2007, Pages 4728-4733

  Ouchi, Akihiko ^a   Bastl, Zdeněk ^b   Boháček, Jaroslav ^c   Šubrt, Jan ^c   Pola, Josef ^d  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

Author keywords

Chemical liquid deposition; Copper films; Cu(II) acetylacetonate; Laser photolysis

Indexed keywords

CHARACTERIZATION; COPPER; ELECTRON MICROSCOPY; PHOTOLYSIS; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ACETYLACETONATE; CHEMICAL LIQUID DEPOSITION; COPPER FILMS; LASER PHOTOLYSIS;

COATING TECHNIQUES;

CHARACTERIZATION; COATING TECHNIQUES; COPPER; ELECTRON MICROSCOPY; PHOTOLYSIS; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33845347074     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.10.019     Document Type: Article

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