Low resistivity LCVD direct write Cu conductor lines for IC customisation

Physica Scripta T

Volumn 69, Issue , 1997, Pages 237-241

  Moilanen, H ^a   Remes, J ^a   Leppavuori S ^a  

^a UNIVERSITY OF OULU   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; ELECTRIC CONDUCTIVITY; INTEGRATED CIRCUITS; LASER APPLICATIONS; LASER BEAMS; MORPHOLOGY; OPTICAL MICROSCOPY; SUBSTRATES; SURFACES;

CONDUCTIVE LINES; COPPER HEXAFLUOROACETYLACETONATE; DEPTH PROFILING; FOUR POINT PROBE; INTEGRATED CIRCUIT CUSTOMIZATION; LASER CHEMICAL VAPOR DEPOSITION;

COPPER;

EID: 0030785920     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)

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10. Remes, J., Moilanen, H. and Leppävuori, S., Proc. 17th NSM, (1996).