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Volumn 76, Issue 5, 2006, Pages 842-848

Diffusion of boron in silicon: Compatibility of empirical molecular dynamics with continuum simulations

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EID: 33845305488     PISSN: 02955075     EISSN: 12864854     Source Type: Journal    
DOI: 10.1209/epl/i2006-10334-y     Document Type: Article
Times cited : (5)

References (18)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.