Influence of photo-initiator concentration on residual mechanical stress in SU-8 thin films

2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings

Volumn 1, Issue , 2006, Pages 79-82

  Psoma, S D ^a   Jenkins, D W K ^a   Derbyshire, G E ^a   Stevens, R ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Fabrication; Negative photoresist; Photo initiator; Residual stress; SU 8 films

Indexed keywords

CONCENTRATION (PROCESS); PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; RESIDUAL STRESSES; THIN FILMS;

NEGATIVE PHOTORESISTS; PHOTO-INITIATORS; SU-8 FILMS;

INITIATORS (CHEMICAL);

EID: 33845232291     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. K.Y. Lee, N. LaBianca, S.A. Rishton, S. Zolgharnain, J.D. Gelorme, J. Shaw and T.H.-P. Chang, "Micromachining applications of a high resolution ultrathick photoresist", J. Vac. Sci. Technol. B, Vol. 13(6), pp 3012-3016, 1995.
2. H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud and P. Vettiger, "SU-8: a low-cost negative resist for MEMS", J. Micromech. Microeng. 1997, Vol. 7, pp 121-124.
3. H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger and P. Renaud, "High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS", Sensors and Actuators A, Vol. 64, pp 33-39, 1998.
4. D. Esinenco, S.D. Psoma, M.Kusko, A. Schneider and R. Muller, "SU-8 micro-biosensor based on Mach-Zehnder interferometer", Rev. Adv. Mater. Sci., Vol. 10, pp 295-299, 2005.
5. C.G. Khan Malek, "SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMS", Microelectronics Journal, Vol. 33, pp 101-105, 2002.
6. H. Lorenz, M. Laudon and P. Renaud, "Mechanical characterization of a new high-aspect-ratio near UV-photoresist", Microelectronic Engineering, Vol. 41/42, pp 371-374, 1998.
7. M.C. Peterman, P. Huie, D.M. Bloom and H.A. Fishman, "Building thick photoresist structures from the bottom up", J. Micromech. Microeng., Vol.13, pp 380-382, 2003.
8. E.W. Becker, W. Ehrfeld and P. Hagman, "Fabrication of microstructures with extreme structural heights by synchrotron radiation lithography, galvanoforming and plastic forming (LIGA process), Microelectronic Engineering, Vol.4, pp 35-56, 1986.
9. B. Li, M. Liu and Q. Chen "Low stress ultra-thick SU-8 UV photolithography process for MEMS"; J. Microlith., Microfab., Microsyst., 2005, Vol. 4 (4), pp43008-43013.