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Volumn 2005, Issue , 2005, Pages 395-398

Effect of hot carrier stress on the performance, trap densities and transient behavior of SLS ELA TFTs

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CURRENTS; ELECTRON TRAPS; PARAMETER ESTIMATION; POLYSILICON; THIN FILM TRANSISTORS; TRANSIENTS; ULTRATHIN FILMS;

EID: 33751440305     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2005.1546668     Document Type: Conference Paper
Times cited : (8)

References (14)
  • 4
    • 0035474080 scopus 로고    scopus 로고
    • Enhanced degradation in polycrystalline silicon thin-film transistors under dynamic hot-carrier stress
    • October
    • K.M. Chang, Y.H. Chung, G.M. Lin, C.G. Deng and J.H. Lin. Enhanced degradation in polycrystalline silicon thin-film transistors under dynamic hot-carrier stress. IEEE Electron Dev. Lett. EDL-22(10):475-477, October 2001.
    • (2001) IEEE Electron Dev. Lett. , vol.EDL-22 , Issue.10 , pp. 475-477
    • Chang, K.M.1    Chung, Y.H.2    Lin, G.M.3    Deng, C.G.4    Lin, J.H.5
  • 5
    • 0035249625 scopus 로고    scopus 로고
    • Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors
    • February
    • F.V. Farmakis, J. Brini, G. Kamarinos and C.A. Dimitriadis. Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors. IEEE Electron Dev. Lett. EDL-22(2): 74-76, February 2001.
    • (2001) IEEE Electron Dev. Lett. , vol.EDL-22 , Issue.2 , pp. 74-76
    • Farmakis, F.V.1    Brini, J.2    Kamarinos, G.3    Dimitriadis, C.A.4
  • 6
    • 0036611165 scopus 로고    scopus 로고
    • A poly-Si TFT fabricated by excimer laser recrystallization on floating active structure
    • June
    • C.-H. Kim, I.-H. Song, W.-J. Nam, M.-K. Han. A poly-Si TFT fabricated by excimer laser recrystallization on floating active structure. IEEE Electron Dev. Lett. EDL-23(6):315-317, June 2002.
    • (2002) IEEE Electron Dev. Lett. , vol.EDL-23 , Issue.6 , pp. 315-317
    • Kim, C.-H.1    Song, I.-H.2    Nam, W.-J.3    Han, M.-K.4
  • 7
    • 0042164526 scopus 로고    scopus 로고
    • Assessment of the performance of laser-based lateral crystallization technology via analysis and modeling of polysilicon thin-film-transistor mobility
    • June
    • A.T. Voutsas. Assessment of the Performance of Laser-based Lateral Crystallization Technology via Analysis and Modeling of Polysilicon Thin-Film-Transistor Mobility. IEEE Trans. Electron Dev. ED-50(6):1494-1500, June 2003.
    • (2003) IEEE Trans. Electron Dev. , vol.ED-50 , Issue.6 , pp. 1494-1500
    • Voutsas, A.T.1
  • 9
    • 0037416534 scopus 로고    scopus 로고
    • Parametric investigation of SLS-processed poly-silicon thin films for TFT applications
    • March
    • M.A. Crowder, M. Moriguchi, Y. Mitani and A.T. Voutsas. Parametric investigation of SLS-processed poly-silicon thin films for TFT applications. Thin Solid Films 427:101-107, March 2003.
    • (2003) Thin Solid Films , vol.427 , pp. 101-107
    • Crowder, M.A.1    Moriguchi, M.2    Mitani, Y.3    Voutsas, A.T.4
  • 10
    • 15544371310 scopus 로고    scopus 로고
    • Effect of silicon thickness on the degradation mechanisms of sequential-laterally-solidified polycrystalline silicon thin-film-transistors during hot-carrier stress
    • March
    • A.T. Voutsas, D.N. Kouvatsos, L. Michalas and G.J. Papaioannou. Effect of Silicon Thickness on the Degradation Mechanisms of Sequential-Laterally- Solidified Polycrystalline Silicon Thin-Film-Transistors During Hot-Carrier Stress. IEEE Electron Dev. Lett. EDL-26(3):181-184, March 2005.
    • (2005) IEEE Electron Dev. Lett. , vol.EDL-26 , Issue.3 , pp. 181-184
    • Voutsas, A.T.1    Kouvatsos, D.N.2    Michalas, L.3    Papaioannou, G.J.4
  • 11
    • 0348195954 scopus 로고    scopus 로고
    • Effect of process parameters on the structural characteristics of laterally-grown polycrystalline silicon films
    • December
    • A.T. Voutsas, A. Limanov and J.S. Im. Effect of Process Parameters on the Structural Characteristics of Laterally-Grown Polycrystalline Silicon Films. J. Appl. Phys. 94(12):7445-7452, December 2003.
    • (2003) J. Appl. Phys. , vol.94 , Issue.12 , pp. 7445-7452
    • Voutsas, A.T.1    Limanov, A.2    Im, J.S.3
  • 13
    • 0030214010 scopus 로고    scopus 로고
    • Leakage current mechanism in sub-micron polysilicon thin-film transistors
    • August
    • K.R. Olasupo and M.K. Hatalis. Leakage current mechanism in sub-micron polysilicon thin-film transistors. IEEE Trans. Electron Dev. ED-43(8):1218-1223, August 1996.
    • (1996) IEEE Trans. Electron Dev. , vol.ED-43 , Issue.8 , pp. 1218-1223
    • Olasupo, K.R.1    Hatalis, M.K.2
  • 14
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    • The effect of Generation-Recombination mechanisms on the transient behavior of polycrystalline silicon transistors
    • in press
    • G. J. Papaioannou, A. Voutsas, M. Exarchos and D. Kouvatsos. The effect of Generation-Recombination mechanisms on the transient behavior of polycrystalline silicon transistors. Thin Solid Films (in press).
    • Thin Solid Films
    • Papaioannou, G.J.1    Voutsas, A.2    Exarchos, M.3    Kouvatsos, D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.