Photolabile carboxylic acid protected terpolymers for surface patterning. Part 1: Polymer synthesis and film characterization

Langmuir

Volumn 22, Issue 22, 2006, Pages 9436-9445

  Millaruelo, M ^a   Eichhorn, K J ^a   Sieczkowska, B ^a   Voit, B ^a  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLIC ACIDS; DIFFERENTIAL SCANNING CALORIMETRY; IRRADIATION; NUCLEAR MAGNETIC RESONANCE; POLYMETHYL METHACRYLATES; SURFACE TREATMENT; SYNTHESIS (CHEMICAL); THIN FILMS;

COVALENT ATTACHMENT; GLYCIDYL METHACRYLATE DERIVATIVES; PHOTOLABILE COMPONENTS; TRIMETHOXYSILOXANES;

TERPOLYMERS;

EID: 33751432170     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la060026p     Document Type: Article

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