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Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 235-238

Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering

(4) Yoshimura, Kazuki a Miki, Takeshi a Iwama, Saburo b Tanemura, Sakae a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b DAIDO UNIVERSITY (Japan)

Author keywords

Amorphous; Crystallized; Niobium oxide; Surface morphology

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COMPOSITION; CRYSTALLINE MATERIALS; ELECTROCHROMISM; MAGNETRON SPUTTERING; MORPHOLOGY; NIOBIUM COMPOUNDS; OPTICAL PROPERTIES; SURFACE STRUCTURE; SURFACES;

BAND GAP; CONDUCTIVE COATING; CRYSTALLIZED FILMS; ELECTROCHROMIC THIN FILMS; NIOBIUM OXIDE; PROFILOMETER; SPECTRAL TRANSMITTANCE;

THIN FILMS;

EID: 0030219381 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(96)08640-3 Document Type: Article

Times cited : (73)

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