Structural, bonding and physical characteristics of phosphorus-doped hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 280-286

  Rusop, Mohamad ^a   Soga, Tetsuo ^a   Jimbo, Takashi ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Microstructure; PECVD; Phosphorus doping; Photovoltaic; Solar cell

Indexed keywords

CARBON; DOPING (ADDITIVES); ELECTRONIC PROPERTIES; HYDROGENATION; MICROSTRUCTURE; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; THIN FILMS;

DOPANT PRECURSORS; OPEN CIRCUIT; PHOPHORUS DOPING; VERSATILITY;

AMORPHOUS FILMS;

EID: 17644390219     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.138     Document Type: Conference Paper

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