Experimental measurements of electron scattering parameters in Cu narrow lines

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2396-2401

  Maitrejean S ^a   Gers, R ^a   Mourier, T ^a   Toffoli, A ^a   Passemard, G ^b  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COPPER; ELECTRIC CONDUCTIVITY; ELECTRIC LINES; GRAIN BOUNDARIES; SCATTERING PARAMETERS; SURFACE TREATMENT;

FUCHS AND SONDHEIMER APPROACH; GRAIN BOUNDARY EFFECT; METALLIC LINES; SURFACE EFFECT;

ELECTRON SCATTERING;

EID: 33751248257     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.044     Document Type: Article

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