UHV arc for high quality film deposition

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 3987-3992

  Russo, R ^a   Cianchi, A ^b   Akhmadeev, Y H ^c   Catani, L ^b   Langner, J ^d   Lorkiewicz, J ^b   Polini, R ^e   Ruggiero, B ^a   Sadowski, M J ^d   Tazzari, S ^e   Koval, N N ^c  

^a CNR   (Italy)

^b INFN SEZIONE DI ROMA TOR VERGATA   (Italy)

^c INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^d SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^e UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Niobium; Superconductivity; Thin film; UHV; UHVCA; Vacuum Arc

Indexed keywords

DEPOSITION; ELECTRIC PROPERTIES; SUPERCONDUCTIVITY; THIN FILMS; ULTRAHIGH VACUUM;

CATHODIC ARC DEPOSITION; FILM DEPOSITION; NIOBIUM FILMS; ULTRA-HIGH VACUUM CONDITIONS (UHVCA); VACUUM ARC;

NIOBIUM;

DEPOSITION; ELECTRIC PROPERTIES; NIOBIUM; SUPERCONDUCTIVITY; THIN FILMS; ULTRAHIGH VACUUM;

EID: 33751218034     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.017     Document Type: Article

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