Comparison of filtered high-current pulsed arc deposition (φ-HCA) with conventional vacuum arc methods

Surface and Coatings Technology

Volumn 126, Issue 1, 2000, Pages 81-88

  Witke, T ^a   Schuelke, T ^b   Schultrich, B ^a   Siemroth, P ^a   Vetter, J ^c  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b Fraunhofer USA Inc   (United States)

^c Metaplas Ionon GmbH   (Germany)

Author keywords

Hard coatings; Metallic films; Optical films; Plasma filter; Vacuum arc

Indexed keywords

DEPOSITION; HARDNESS; METALLIC FILMS; OPTICAL FILMS; VACUUM APPLICATIONS;

HIGH-CURRENT PULSED ARC DEPOSITION;

PROTECTIVE COATINGS;

COATING; FILM; HARDNESS;

EID: 0034599699     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00544-2     Document Type: Article

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