Effects of deposition and post-annealing conditions on electrical properties and thermal stability of TiAlN films by ion beam sputter deposition

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 1069-1073

  Lee, Sheng Yi ^a   Wang, Sheng Chang ^b   Chen, Jen Sue ^a   Huang, Jow Lay ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

IBSD; Ion beam voltage; Substrate temperature; Thermal stability; TiAIN

Indexed keywords

ANNEALING; ION BEAMS; KINETIC ENERGY; OXIDATION RESISTANCE; SPUTTER DEPOSITION; SUBSTRATES; THERMODYNAMIC STABILITY;

BEAM VOLTAGE; DENSE STRUCTURE; ION BEAM SPUTTER DEPOSITION (IBSD); ION BEAM VOLTAGE; SUBSTRATE TEMPERATURE;

TITANIUM COMPOUNDS;

EID: 33751051161     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.172     Document Type: Article

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