Nanosecond time resolution in-situ optical reflection and transmission measurements during XeF excimer laser interaction with amorphous silicon thin films

Materials Science Forum

Volumn 505-507, Issue PART 1, 2006, Pages 337-342

  Kuo, C C ^a,b   Yeh, W C ^a   Chen, C B ^a   Jeng, J Y ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Crystallization mechanism; Excimer laser crystallization; Explosive crystallization; In situ optical reflection and transmission measurement

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLIZATION; SILICA; SURFACE ROUGHNESS; THIN FILMS;

CRYSTALLIZATION MECHANISM; EXCIMER LASER CRYSTALLIZATION; EXPLOSIVE CRYSTALLIZATION;

EXCIMER LASERS;

EID: 33750829785     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-990-3.337     Document Type: Conference Paper

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