Electrochemical deposition of Prussian blue on hydrogen terminated silicon(111)

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1847-1850

  Zhao, Jianwei ^a   Zhang, Yan ^a   Shi, Chuanguo ^a   Chen, Hongyuan ^a   Tong, Lianming ^b   Zhu, Tao ^b   Liu, Zhongfan ^b  

^a NANJING UNIVERSITY   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

Electrochemical deposition; Prussian blue; Silicon; Voltammetry

Indexed keywords

ELECTRODEPOSITION; FILM GROWTH; HYDROGEN; RAMAN SPECTROSCOPY; SILICON; X RAY SPECTROSCOPY;

ELECTROCHEMICAL DEPOSITION; PRUSSIAN BLUE; SILICON SURFACES;

PIGMENTS;

EID: 33750820922     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.011     Document Type: Article

References (27)

1. Huang Y., Duan X., Cui Y., Lauhon L.J., Kim K.H., and Lieber C.M. Science 294 (2001) 1313
2. Rhürnschopf K., Borgmann D., and Wedler G. Thin Solid Films 280 (1996) 171
3. Adachi T. Surf. Sci. 506 (2002) 305
4. Ye X.R., Wai C.M., Zhang D.Q., Kranov Y., Mcilory D.N., Lin Y.H., and Engelhard M. Chem. Mater. 15 (2003) 83
5. Eftekhari A. J. Electroanal. Chem. 558 (2003) 75
6. Park I.D., and Kim H.K. Appl. Phys. Lett. 64 (1994) 1774
7. Boukherroub R., Morin S., Bensebaa F., and Wayner D.D.M. Langmuir 15 (1999) 3183
8. Yu W.H., Wang E.T., Neoh K.G., and Zhu S.P. J. Phys. Chem., B 107 (2003) 10198
9. Tilley R.D., and Saito S. Langmuir 19 (2003) 5115
10. Gurtner C., Edman C.F., Formosa R.E., and Heller M.J. J. Am. Chem. Soc. 122 (2000) 36
11. Ohkoshi S., Abe Y., Fujishima A., and Hashimoto K. Phys. Rev. Lett. 62 (1992) 1285
12. Zhou P., Xue D., Lou H., and Chen X. Nano Lett. 2 (2002) 845
13. Lundgren C.A., and Murray R.W. Inorg. Chem. 27 (1998) 933
14. Pyrasch M., and Tieke B. Langmuir 17 (2001) 7706
15. Somani P.R., and Radhakrishnan S. Mater. Chem. Phys. 77 (2003) 117
16. Inoue H., and Yanagisawa S. J. Inorg. Nucl. Chem. 36 (1974) 1409
17. Nott N.F. Contemp. Phys. 18 (1997) 225
18. Itaya K., Ataka T., and Toshima S. J. Am. Chem. Soc. 104 (1982) 4767
19. Xia L., and McCreery R.L. J. Electrochem. Soc. 146 (1999) 3696
20. Ellis D., Eckhoff M., and Neff V.D. J. Phys. Chem., B 85 (1981) 1225
21. Zhao J., and Uosaki K. J. Phys. Chem., B 108 (2004) 17129
22. Zhao J., and Uosaki K. Appl. Phys. Lett. 83 (2003) 2034
23. Zhang D., Wang K., Sun D., Xia X., and Chen H. Chem. Mater. 15 (2003) 4163
24. PDF#52-1907.
25. Nakanishi S., Lu G., Kothari H.M., Vohannan E.W., and Switzer J.A. J. Am. Chem. Soc. 125 (2003) 14998
26. Itaya K., Uchida I., and Neff V.D. Acc. Chem. Res. 19 (1986) 162
27. Karyakin A.A., and Karyakina E.E. Russ. Chem. Bull. 50 (2001) 1811 (Int. Ed.)