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Volumn 515, Issue 4, 2006, Pages 1970-1975
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Effects of gas flow rate on diamond deposition in a microwave plasma reactor
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Author keywords
Chemical vapor deposition (CVD); Diamond; Field emission; Nanostructures; Plasma processing and deposition; Surface roughness
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DIAMOND CUTTING TOOLS;
FLOW PATTERNS;
GAS DYNAMICS;
MICROWAVE DEVICES;
RAMAN SPECTROSCOPY;
SILICON;
SURFACE ROUGHNESS;
FIELD EMISSION;
NANOSTRUCTURES;
PLASMA DEPOSITION;
PLASMA PROCESSING;
CHEMICAL REACTORS;
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EID: 33750800866
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.08.007 Document Type: Article |
Times cited : (36)
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References (26)
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