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Volumn 515, Issue 4, 2006, Pages 1970-1975

Effects of gas flow rate on diamond deposition in a microwave plasma reactor

Author keywords

Chemical vapor deposition (CVD); Diamond; Field emission; Nanostructures; Plasma processing and deposition; Surface roughness

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND CUTTING TOOLS; FLOW PATTERNS; GAS DYNAMICS; MICROWAVE DEVICES; RAMAN SPECTROSCOPY; SILICON; SURFACE ROUGHNESS;

EID: 33750800866     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.007     Document Type: Article
Times cited : (36)

References (26)
  • 18
    • 33750813833 scopus 로고    scopus 로고
    • JCDPS Powder Diffraction File; International Centre for Diffraction Data, Swarthmor, 1990.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.