Femtosecond fabricated photomasks for fabrication of microfluidic devices

Optics Express

Volumn 14, Issue 22, 2006, Pages 10753-10758

  Day, Daniel ^a   Gu, Min ^a  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ETCHING; LASER PULSES; MASKS; MICROELECTRONICS; POLYMETHYL METHACRYLATES;

ENERGY DENSITY; MICROFLUIDIC DEVICES; PHOTOMASK; POLYDIMETHYLSILOXANE;

PHOTOLITHOGRAPHY;

EID: 33750703610     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.010753     Document Type: Article

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