Spatial characterization of Ar-Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy

Plasma Sources Science and Technology

Volumn 15, Issue 4, 2006, Pages 790-796

  Britun, N ^a   Gaillard, M ^a   Schwaederle L ^a   Kim, Y M ^a   Han, J G ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRIC DISCHARGES; ELECTRIC REACTORS; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING;

ABSORPTION DATA; EMISSION DECREMENT; MAGNETRON REACTORS; PLANAR MAGNETRON;

PLASMAS;

EID: 33750581243     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/024     Document Type: Article

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