Magnetron plasma structure with strong magnetic field

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 27-31

  Shidoji, Eiji ^a   Makabe, Toshiaki ^b  

^a ASAHI GLASS CO LTD   (Japan)

^b KEIO UNIVERSITY   (Japan)

Author keywords

Computer simulation; Glow discharge; Plasma processing and depostition; Sputtering

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; ELECTRIC FIELDS; GLOW DISCHARGES; MAGNETIC FIELD EFFECTS;

PLASMA STRUCTURES;

MAGNETRON SPUTTERING;

EID: 0141525137     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00933-7     Document Type: Conference Paper

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