Characterization of low refractive index SiOCF:H films designed to enhance the efficiency of light emission

Journal of Electroceramics

Volumn 16, Issue 4, 2006, Pages 469-472

  Yoon, S G ^a   Park, W J ^a   Kim, H ^a   Kim, S W ^b   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

^b Kumoh National Institute of Technology   (South Korea)

Author keywords

Anti reflection (AR) coating; Low refractive index; OLED; PECVD; SiOCF:H

Indexed keywords

ANTIREFLECTION COATINGS; LIGHT EMISSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SURFACE ROUGHNESS;

DEPOSITION TEMPERATURE; RADIO FREQUENCY POWER; REFLECTIVE INDEX MATERIALS;

OPTICAL FILMS;

EID: 33750568675     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-006-9899-8     Document Type: Conference Paper

References (14)

1. S.H. Jangjian, C.P. Liu, Y.L. Wang, W.S. Hwang, and W.E. Tseng, Thin solid films, 469, 460 (2004).
2. G.K.M. Thutupalli and C.L. Nagenda, Ind J. Phy., 63A, 661 (1989).
3. K.H. Guenther, Appl. Opt., 23, 3612 (1984).
4. J.T. Cox and O. Hass, J. Opt. Soc. Am., 52, 437 (1958).
5. H. Angus Macleod, Thin Film Optical Filters third edition (Institute of Physics Publishing, 2001) Ch. 3, p. 87.
6. H.S. Moon, et al., J. Mat. Sci., 29, 3372 (1993).
7. D. Ochs and B. Cord, Appl. Phys. A: Mater. Sci. Proc., 78, 637 (2004).
8. S. Ali, M. Gharghi, S. Sivoththaman, and K. Zeaiter, J. Mater. Sci., 40, 1467 (2005).
9. C.S. Yang, et al., Thin Solid Films, 475, 150 (2005).
10. H.J. Kim, Q. Shao and Y.H. Kim, Surface and Coatings Technology, 171, 39 (2003).
11. Y.H. Kim, S.K. Lee, H.J. Kim, J. Vac. Sci. Technol., A. Vac. Surf. Films, 18, 1216 (2000).
12. S.M. Yun, H.Y. Chang, M.S. Kang, and C.K. Choi, Thin Solid Films 341, 109 (1999).
13. C. Rau and W. Kulisch, Thin solid films, 249, 28 (1994).
14. Y. Ma, H. Yang, J. Guo, C. Sathe, A. Agui, and Nordgren, J. Appl. Phys. Lett., 72, 3353 (1998).