Safe precursor gas for broad replacement of SiH4 in plasma processes employed in integrated circuit production

Materials Research Society Symposium - Proceedings

Volumn 447, Issue , 1997, Pages 145-150

  Loboda, M J ^a   Seifferly, J A ^a   Grove, C M ^a   Schneider, R F ^a  

^a DOW CORNING CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCIDENT PREVENTION; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; FILM GROWTH; INTEGRATED CIRCUIT MANUFACTURE; PLASMA APPLICATIONS; SILICA; SILICON NITRIDE;

PLASMA DEPOSITION PROCESSES; PYROPHORIC GAS; TRIMETHYLSILANE;

SILANES;

EID: 0030706734     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)