Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry

Spectroscopy (Santa Monica)

Volumn 21, Issue 10, 2006, Pages 26-31

  Chen, Yanyan ^a,b   Jin, Gang ^a  

^a INSTITUTE OF MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACE LAYER; OPTICAL MODEL; THICKNESS ANALYSIS; VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY;

ELLIPSOMETRY; INTERFACES (MATERIALS); MATHEMATICAL MODELS; REFRACTIVE INDEX; SILICA;

FILM GROWTH;

EID: 33750188042     PISSN: 08876703     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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