Mist deposition of thin photoresist films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 861-866

  Mahoney, William ^a   Roman, Paul ^c   Mumbauer, Paul ^c   Ruzyllo, Jerzy ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b The Pennsylvania State University   (United States)

^c Primaxx Inc   (United States)

Author keywords

Mist deposition; Photoresist; Spin on; Thin resist application

Indexed keywords

MIST DEPOSITION; SPIN-ON; THIN RESIST APPLICATION;

ATOMIZATION; DEPOSITION; INTEGRATED CIRCUITS; MICROELECTRONICS; PARAMETER ESTIMATION; PHOTOCHEMICAL REACTIONS; PHOTORESISTORS; POLYETHYLENE GLYCOLS;

THIN FILMS;

EID: 3843114380     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534149     Document Type: Conference Paper

References (5)

1. Lee, D.O., P. Roman, P. Mumbauer, R. Grant, M. Horn, and J. Ruzyllo, "Studies of High-k Gate Dielectrics Deposited by Liquid Source Misted Chemical Deposition Method", Proc. Fifth Intern. Symp. on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues., Eds. M.J. Loboda, R. Singh, S.S. Ang and H.S. Rathore, Vol. PV 2000-5, pgs. 237-243, The Electrochem. Soc. Proc., 2000.
2. Lee, D.-O., P. Roman, C.-T. Wu, P. Mumbauer, M. Brubaker, R. Grant, and J. Ruzyllo, "Mist Deposited High-k Dielectrics for Next Generation MOS Gates", Solid-State Electronics, v. 46, pg. 1671, 2002
3. Solayappan N., Joshi V., DeVilbiss A., Bacon J., Cuchiaro J., McMillan L. and Paz de Araujo C., "Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films", Integrated ferroelectrics, Ed. Taylor G.W, pgs. 127-136, Gordon and Breach Sc. Publishers, New York, 1997.
4. Technical Specifications, Shipley Microposit 1800 Series Photo Resist, Shipley Inc.
5. Levinson, Harry J., Principles of Lithography, pgs 66-67, SPIE Press, Bellingham WA., 2001.