Evaporated electron beam lithography resist for non-planar surfaces

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Volumn , Issue , 2003, Pages 152-153

  Lavallee E ^a   Beauvais, J ^a   Drouin, D ^a   Kelkar, P ^a   Yang, P ^a   Turcotte, D ^a   Cloutier, M ^a   Legario, R ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; SURFACE ROUGHNESS; THERMAL EVAPORATION;

NON-PLANAR SURFACES;

ELECTRON BEAM LITHOGRAPHY;

EID: 84949229898     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2003.1268621     Document Type: Conference Paper

References (2)

1. S. Babin, M. Weber, H.W.P. Koops, JVSTB, 14. pp.4076-4079(1996)
2. H. Ulon, G. Mills, B.K. Chong, A. Midha, L. Donaldson, J.M.R. Weaver, JVSTA. 17, pp. 2233-2239(1999)