Design, simulation, fabrication, and characterization of a digital variable optical attenuator

Journal of Microelectromechanical Systems

Volumn 15, Issue 5, 2006, Pages 1190-1200

  Sun, Winston ^a   Noell, Wilfried ^b   Zickar, Michael ^b   Mughal, M Junaid ^c   Perez, Frank ^c   Riza, Nabeel A ^c,d   De Rooij, Nicolaas F ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^c Nuonics Inc   (United States)

^d UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Deep reactive ion etch (DRIE); Hydrofluoric (HF) vapor phase etching (VPE); Micro mirrors; Silicon on insulator (SOI); Variable optical attenuator (VOA)

Indexed keywords

DEEP REACTIVE ION ETCH (DRIE); DIGITAL VARIABLE OPTICAL ATTENUATOR (VOA); HYDROFLUORIC (HF); MICROMIRRORS; VAPOR-PHASE-ETCHING (VPE); VARIABLE OPTICAL ATTENUATOR (VOA);

ALGORITHMS; COMPUTER SIMULATION; ITERATIVE METHODS; LINEARIZATION; MIRRORS; SILICON ON INSULATOR TECHNOLOGY; WAVEGUIDE ATTENUATORS;

OPTICAL WAVEGUIDES;

EID: 33749992455     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2006.879699     Document Type: Article

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