Design and characteristics of a micromachined variable optical attenuator with a silicon optical wedge

Optics Communications

Volumn 221, Issue 4-6, 2003, Pages 323-330

  Lee, Jong Hyun ^a   Kim, Young Yun ^a   Yun, Sung Sik ^a   Kwon, Honam ^a   Hong, Yoon Shik ^b   Lee, Jung Hyun ^b   Jung, Sung Cheon ^b  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

Author keywords

Deep reactive ion etching; Microelectromechanical systems; Refractive optical wedge; Silicon microwedge; Variable optical attenuator

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; LIGHT REFLECTION; MICROMACHINING; OPTICAL FIBERS; OPTICAL SHUTTERS; REACTIVE ION ETCHING; REFRACTIVE INDEX; SILICON WAFERS; WAVELENGTH DIVISION MULTIPLEXING;

OPTICAL WEDGE;

OPTICAL COMMUNICATION;

EID: 0038044633     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(03)01506-2     Document Type: Article

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