Optomechanical Monte Carlo tolerancing study of a packaged free-space intra-MCM optical interconnect system

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 12, Issue 5, 2006, Pages 988-995

  Vervaeke, Michael ^a,b   Debaes, Christof ^a,b   Volckaerts, Bart ^b,c   Thienpont, Hugo ^a,b  

^a IEEE   (Belgium)

^b VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^c Research and Development   (Belgium)

Author keywords

Deep lithography with protons (DLP); Monte Carlo simulation; Optical interconnects

Indexed keywords

DEEP LITHOGRAPHY WITH PROTONS (DLP); OPTICAL SIMULATION SOFTWARE; OPTOMECHANICAL MONTE CARLO SIMULATOR;

COMPUTER SIMULATION; LIGHT TRANSMISSION; LITHOGRAPHY; MONTE CARLO METHODS; PROTONS; SENSITIVITY ANALYSIS;

OPTICAL INTERCONNECTS;

EID: 33749854582     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2006.882622     Document Type: Article

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