Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

Applied Optics

Volumn 45, Issue 22, 2006, Pages 5642-5650

  Garoli, Denis ^a,b   Frassetto, F ^a,b   Monaco, G ^a   Nicolosi, P ^a,b   Pelizzo, M G ^b   Rigato, F ^b   Rigato, V ^b   Giglia, A ^c,d   Nannarone, S ^c,d  

^a UNIVERSITY OF PADOVA   (Italy)

^b CNR   (Italy)

^c LABORATORIO TASC   (Italy)

^d UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON CARBIDE; STOICHIOMETRY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

C/SI RATIO; INCIDENT BEAM POLARIZATION; OPTICAL CONSTANTS;

LIGHT REFLECTION;

EID: 33749846532     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.005642     Document Type: Article

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