메뉴 건너뛰기




Volumn 144-147, Issue , 2005, Pages 987-992

VUV reflectance measurements and optical constants of SiC thin films

Author keywords

Optical coatings; Optical constants; SiC; VUV

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL COATINGS; PARAMETER ESTIMATION; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 17444398230     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.248     Document Type: Conference Paper
Times cited : (5)

References (9)
  • 1
    • 17444391116 scopus 로고    scopus 로고
    • Advances in mirror technology for X-ray, EUV lithography, laser, and other applications
    • See for example, in: A.M. Khounsary, U. Dinger, K. Ota (Eds.), Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and other Applications, SPIE Conference Proceedings, vol. 5193, 2003.
    • (2003) SPIE Conference Proceedings , vol.5193
    • Khounsary, A.M.1    Dinger, U.2    Ota, K.3
  • 2
    • 17444382182 scopus 로고    scopus 로고
    • Ultraviolet and X-ray detection, spectroscopy and polarimetry III
    • See for example, in: S. Fineschi, B.E. Wooodgate, R.A. Kimble (Eds.), Ultraviolet and X-ray Detection, Spectroscopy and Polarimetry III, SPIE Conference Proceedings, vol. 3764, 1999.
    • (1999) SPIE Conference Proceedings , vol.3764
    • Fineschi, S.1    Wooodgate, B.E.2    Kimble, R.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.